Lecture 2:半导体基础

半导体的定义与晶体结构、能带理论与带隙、电子与空穴、态密度、掺杂、热平衡、费米狄拉克统计与载流子浓度

What is Semiconductor | 什么是半导体

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  1. Conductivity lies between that of conductors(导体) and insulators(绝缘体).
  2. Generally crystalline in structure for IC devices | 在集成电路器件中通常呈晶体结构.
  • In recent years, however, non-crystalline semiconductors(非晶半导体) have become commercially important(具有商业价值)
  • Graphene | 石墨烯

Typical Semiconductor |典型半导体

  1. Silicon: diamond cubic structure 金刚石立方结构
  2. GaAs: ZnS (Zinc Blende) structure

How Many Silicon Atoms per cm3?

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等效硅原子在一个立方晶格中是8个,每个立方晶格占地(.543nm)3(.543nm)^3,于是可求Si 的数密度为 5×1022cm−35\times10^{22}cm^{-3}

Compound (or elemental) Semiconductors 化合(或元素)半导体

  • A compound semiconductor is a semiconducting material formed from two or more different chemical elements, like GaN.
  • This is different from an elemental semiconductor, like silicon (Si), which is made from only one element.

Energy Band theory | 能带理论

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根据量子力学,在晶体中,随着相互作用原子数量 nn 的增加,会形成连续的能带

Result from quantum mechanics: formation of continuous energy bands in a crystal with increasing number of interacting atoms

Conduction (or valence) band 导(价)带

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  • 价带:The highest nearly-filled band is the valence band.
  • 导带:The lowest nearly-empty band is the conduction band.

Energy Band Diagram | 能带图

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  • EcE_c: Bottom edge of the conduction band (EcE_c)
  • EvE_v: Top edge of the valence band (EvE_v)

EcE_c and EvE_v are separated by the band gap energy EGE_G

Band Gap and Material Classification | 带隙与材料分类

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Filled bands and empty bands do not allow current flow

  • Insulators have large EGE_G | 绝缘体有很高的band gap
  • Semiconductors have small EGE_G | 半导体有很小的band gap
  • Metals have no band gap. Conduction band is partially filled | 金属没有band gap,导带是被部分填满的

How to measure bandgap energy | 带隙测量

EGE_G can be determined from the minimum energy of photons(光子,注意区分声子:phonon) that are absorbed by the semiconductor.

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Electronic Properties of Si | 硅的电特性

  1. Silicon is a semiconductor material. Pure Si has high electrical resistivity at room temperature. | 纯净Si在室温有很高的电阻
  2. There are 2 types of mobile charge-carriers in Si:
    • 电子:Conduction electrons are negatively charged;
    • 空穴:Holes are positively charged.
  3. The concentration of conduction electrons & holes in a semiconductor can be modulated(调整) in several ways| 四种因素会影响载流子浓度:
    • Adding impurity atoms (dopants) 掺杂
    • Applying to an electrical field 施加电场
    • Changing the temperature 改变温度
    • Irradiation 辐照

Bond Model of Electrons and Holes

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  • When an electron breaks loose and becomes a conduction electron, a hole is also created.
  • In a pure Si crystal, conduction electronics and holes are formed in pairs.

Hole | 空穴

Mobile positive charge associated with a half-filled covalent bond. (与半填充共价键相关的可移动正电荷)

  • Treat as positively charged mobile particle(粒子) in the semiconductor.

Definition of Terms

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n = number of electrons/cm3

p = number of holes/cm3

nin_i = intrinsic carrier concentration

In a pure semiconductor, n=p=nin = p = n_i

In a doped semiconductor, np=ni2np = n_i^2

Bond theory: Density of state 状态密度

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g(E)dE=g (E)dE = number of states per cm3cm^3 in the energy range between EEand E+dEE+dE

gc(E)=mn∗2mn∗(E−Ec)π2ℏ3E≥Ecg_c(E) = \frac{m_n^* \sqrt{2m_n^*(E - E_c)}}{\pi^2 \hbar^3} \quad E \ge E_cgv(E)=mp∗2mp∗(Ev−E)π2ℏ3E≤Evg_v(E) = \frac{m_p^* \sqrt{2m_p^*(E_v - E)}}{\pi^2 \hbar^3} \quad E \le E_v

m* (effective mass) depends on material(材料) and crystallographic orientation(晶向)

Doping in Sillicon 硅掺杂

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By substituting(替代) a Si atom with a special impurity atom (Group V(Donors) or Group III(Acceptors) element), a conduction electron or hole is created.

Donors: P(Phosphorus), As(Arsenic), Sb(Antimony)

Acceptors: B(Boron), Al(Aluminum), Ga(Gallium), In(Indium)

类型元素符号英文名称
施主 (Donors)PPhosphorus (磷)
AsArsenic (砷)
SbAntimony (锑)
受主 (Acceptors)BBoron (硼)
AlAluminum (铝)
GaGallium (镓)
InIndium (铟)

Donor / Acceptor Levels 施主/受主能级

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Charge-Carrier Concentrations | 载流子浓度

NDN_D: ionized donor concentration (cm-3)

NAN_A: ionized acceptor concentration (cm-3)

Charge neutrality condition:ND+p=NA+nN_D + p = N_A + n

At thermal equilibrium: np=ni2np = n_i^2 (Law of Mass Action)

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Note: Carrier concentrations depend on net dopant concentration (NDN_D - NAN_A) !

提醒

Summary

donor: impurity atom that increases n, for example Group-V elements

acceptor: impurity atom that increases p, for example Group-III elements

n-type material: contains more electrons than holes

p-type material: contains more holes than electrons

majority carrier: the most abundant carrier

minority carrier: the least abundant carrier

intrinsic semiconductor: n=p=nin = p = n_i

extrinsic semiconductor: doped semiconductor: n≠p≠nin \ne p \ne n_i

Dopant concentrations typically range from 101410^{14}cm-3 to 101910^{19}cm-3

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Thermal Equilibrium | 热平衡

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  1. Condition 条件:No external forces are applied:
    • Electric field = 0
    • Magnetic(磁) field = 0
    • Mechanical stress(机械应力) = 0
    • Absolutely no light
  2. Characteristic 特点
    1. Dynamic situation(动态平衡)in which every process is balanced by its inverse process.
      • Electron-hole pair (EHP) generation rate = EHP recombination rate
    2. Thermal agitation(热运动): electrons and holes exchange energy with the crystal lattice and each other.
      • Every energy state in the conduction band and valence band has a certain probability of being occupied by an electron.

动态平衡状态,每个过程都与其逆过程相互平衡。

电子-空穴对(EHP)的生成速率等于其复合速率。

热运动:电子与空穴在晶体晶格中相互交换能量。

导带和价带中的每个能级都有被电子占据的概率

Fermi-Dirac Statistics 费米狄拉克统计

Probability that an available state at energy E is occupied is given by Fermi-Dirac distribution function:

f(E)=11+e(E−EF)/kTf(E) = \frac{1}{1 + e^{(E - E_F) / kT}} 费米狄拉克函数

There is only one Fermi level in a system at equilibrium.

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Effect of Temperature on f(E)

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Boltzmann Approximation | 玻尔兹曼近似

Probability that a state is filled (occupied by an electron):

If E−EF>3kT,f(E)≈e−(E−EF)/kTIf EF−E>3kT,f(E)≈1−e(E−EF)/kT\text{If } E - E_F > 3kT, \quad f(E) \approx e^{-(E - E_F) / kT} \\ \text{If } E_F - E > 3kT, \quad f(E) \approx 1 - e^{(E - E_F) / kT}

Probability that a state is empty (occupied by a hole):

1−f(E)≈e(E−EF)/kT=e−(EF−E)/kT1 - f(E) \approx e^{(E - E_F) / kT} = e^{-(E_F - E) / kT}

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Remember: there is only one Fermi-level in a system at equilibrium.

Distribution of Carriers (载流子分布)

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Obtain n(E) by multiplying gc(E)g_c(E)and f(E)

Obtain p(E) by multiplying gv(E)g_v(E) and 1-f(E)

n(E)=gc(E)f(E)(E≥Ec)n(E)=g_c(E)f(E)(E≥Ec)靠近 EcE_c 处既有可用态 gcg_c,又有一定占据几率 ff,因此电子主要分布在导带底附近

p(E)=gv(E)[1−f(E)](E≤Ev)p(E)=g_v(E)[1−f(E)] (E≤Ev)靠近 EvE_v 处 1−f1-f 较大,因而空穴主要分布在价带顶附近

N-type Semiconductor Distribution (N型载流子分布)

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Equilibrium Electron Concentration(平衡电子浓度)

n=Nce−(Ec−EF)/kTwhere Nc=2(2πmn∗kTh2)3/2n = N_c e^{-(E_c - E_F) / kT} \quad \text{where } N_c = 2 \left( \frac{2\pi m_n^* kT}{h^2} \right)^{3/2}

其中,Si 的Nc=2.8∗1019cm−3N_c = 2.8 * 10^{19} cm^{-3} (Effective DOS of conduction band, 导带有效态密度)

P-type Semiconductor Distribution (P型载流子分布)

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Equilibrium Hole Concentration(平衡空穴浓度)

p=Nve−(EF−Ev)/kTwhere Nv=2(2πmp∗kTh2)3/2p = N_v e^{-(E_F - E_v) / kT} \quad \text{where } N_v = 2 \left( \frac{2\pi m_p^* kT}{h^2} \right)^{3/2}

其中,Si 的Nv=1.04∗1019cm−3N_v = 1.04 * 10^{19} cm^{-3} (Effective DOS of valence band, 价带有效态密度)

Intrinsic Carrier Concentration(本征载流子浓度)

ni=NcNve−EG/2kTn_i = \sqrt{N_c N_v} e^{-E_G / 2kT}

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Lecture 1:摩尔定律与 CMOS
Lecture 3:费米能级、载流子散射与迁移率

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